KETEK Wafer Processing

KETEK is utilizing for its SiPM production an ultraclean silicon processing to avoid any contaminations causing an increase of the dark count rate. Important aspects of the well-established and for many years optimized KETEK Silicon Drift Detector technology could be transferred to the SiPM process.

KETEK SiPMs are processed on 200 mm wafers using a 0.35 µm stepper lithography. The 200 mm wafers provide a very cost effective chip production. The narrow stepper lithography enables KETEK to develop the geometrical efficiency to its limits.

Figure 1: 200 mm Wafer with KETEK SiPMs.